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Prepared from alumina as raw material, suitable for SIC substrate wafer processing, with an acidic pH, suitable for single chip processing technology.

产品说明

1. This product is suitable for one-time polishing with a single polishing machine, and there is no need to add other polishing processes in the future;

2. Acidic aluminum oxide polishing solution containing potassium permanganate;

3. If it is reused, please add corresponding filtering, and it is recommended to use it directly;

4. It is recommended to use a polishing pad with strong corrosion resistance under high speed and pressure.

产品数据
ModelSIC-AC600
Product Attributes
Solid Content<10%
Acid-base

Acidity

Main IngredientAluminium Oxide
Application ScenariosRough Polishing
Processing MaterialsSiC



注意事项

Storage conditions: Avoid direct sunlight and store at a temperature between 0 and 40 ℃;

Warranty: 6 months;

Attention: Avoid prolonged exposure to air;

Package: packaged in ton barrels, weighing 5 kilograms per barrel or 20 kilograms per barrel.