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Synthesized from water glass as raw material, suitable for preparing grinding and polishing liquids. The product has a uniform particle size distribution, good particle integrity, and high hardness.

产品说明

Used to prepare CMP polishing solution for polishing products such as silicon wafers, hard disk drives, glass, lenses, and metal surfaces.

产品数据
Model
NN-4040
Product Attributes
Solid Content38%-42%
Acid-baseBasicity
Main IngredientSilicon Oxide
注意事项

Storage conditions: Avoid direct sunlight, store at a temperature of 0-40 ℃. If it is below 0 ℃, it will produce jelly and be scrapped;

Warranty: 1 year;

Attention: Avoid prolonged exposure to air;

Package: packed in IBC ton drums.