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Synthesized from water glass as raw material, suitable for preparing grinding and polishing liquids. The product has uniform particle size distribution, good particle integrity, and high hardness.


产品说明

1. Polishing: Can be used to prepare CMP polishing solution for high gloss polishing and planarization of products such as silicon, copper, SIC, GAN, aluminum alloys, stainless steel, ceramics, etc;

2. Coating: Various particle sizes and modified silica sol can be used to prepare coatings for different systems.

产品数据
ModelNN-4080
Product Attributes
Solid Content38%-42%
Acid-baseBasicity
Main IngredientSilicon Oxide


注意事项

Storage Conditions: Avoid exposure to the sun. The storage temperature is 0-40 ℃. If it is lower than 0 ℃, gel will be produced and discarded;

Warranty: 1 year;

Attention: Avoid prolonged exposure to air;

Package: Packed in IBC ton drums.