Home - Product - CMP Polishing Fluid - SIC-03 series

Prepared from aluminum oxide as raw material, suitable for SIC substrate wafer processing, pH is alkaline, suitable for multi chip processing technology.


Product Description

1. This product is suitable for single-sided polishing machines and double-sided polishing machines;

2. Alkaline alumina polishing solution containing potassium permanganate;

3. If recycled, please add corresponding filters.

Product Data
ModelSIC-03 series
产品属性Product Attributes
Solid Content<10%
Acid-baseBasicity
Main IngredientAluminium Oxide
Application ScenariosRough Polishin
Processing MaterialsSiC
Precautions

Storage conditions: Indoor storage, choose a cool place, and control the temperature between 0-40 ℃;

Warranty: Under storage conditions, the shelf life is 6 months;

Attention: Please store under dark conditions, otherwise it may affect the shelf life of the product;

Package: 5kg/barrel, 4 barrels/box.