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Prepared from silicon oxide as raw material, suitable for SIC substrate wafer processing, with an acidic pH, suitable for single chip processing technology.

产品说明

1. This product is suitable for one-time polishing with a single polishing machine, and there is no need to add other polishing processes in the future;

2. Acidic silicon oxide polishing solution containing potassium permanganate;

3. If it is reused, please add corresponding filtering, and it is recommended to use it directly;

4. It is recommended to use a polishing pad with strong corrosion resistance under high speed and pressure.

产品数据
ModelSIC-AC80
Product Attributes
Solid Content<10%
Acid-baseAcidity
Main IngredientSilicon Oxide
Application ScenariosFine Polishing
Processing MaterialsSiC


注意事项

Storage conditions: Avoid direct sunlight and store at a temperature between 0 and 40 ℃;

Warranty: 6 months;

Attention: Avoid prolonged exposure to air;

Package: packaged in ton barrels, weighing 5 kilograms per barrel or 20 kilograms per barrel.